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Volumn 69, Issue 16, 2004, Pages
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Nanovoid formation in helium-implanted single-crystal silicon studied by in situ techniques
a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
HELIUM;
SILICON;
ARTICLE;
CRYSTAL;
DESORPTION;
PRESSURE;
SPECTROMETRY;
TEMPERATURE;
TRANSMISSION ELECTRON MICROSCOPY;
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EID: 42749099716
PISSN: 01631829
EISSN: None
Source Type: Journal
DOI: 10.1103/PhysRevB.69.165209 Document Type: Article |
Times cited : (40)
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References (12)
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