Spontaneous roughening of low-coverage Si(100)-2 × 1: Cl surfaces: Patch formation on submonolayer halogenated surface

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 20, 2004, Pages

  Chen, Dongxue ^a   Boland, John J ^b  

^a The University of North Carolina at Chapel Hill   (United States)

^b TRINITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; DIMER; HALOGEN; SILICON;

ARTICLE; CORRELATION ANALYSIS; HALOGENATION;

EID: 42749098775     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.205432     Document Type: Article

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