Deposition of HfO2 thin films on ZnS substrates

Thin Solid Films

Volumn 516, Issue 15, 2008, Pages 4695-4699

  He, Qi ^a,c   Guo, Hui bin ^a   Wei, Jun jun ^a   Askari, S J ^a   Wang, Hong bin ^b   Zhang, Shu yu ^b   Yang, Hai ^b   Su, Xiao ping ^b   Lu, Fan xiu ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS   (China)

^c TAIYUAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Antireflection; Buffer layer; Electron beam evaporation; HfO2 thin films; Reactive magnetron sputtering; Scanning electron microscopy; X ray diffraction; Zinc sulfide

Indexed keywords

DEPOSITION; HAFNIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

ANTIREFLECTION EFFECT; BUFFER LAYER; GRANULAR MICROSTRUCTURE;

THIN FILMS;

EID: 42649141990     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.08.060     Document Type: Article

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