Solid phase crystallisation of HfO2 thin films

Materials Science and Engineering: B

Volumn 118, Issue 1-3, 2005, Pages 127-131

  Modreanu, M ^a   Sancho Parramon, J ^a   O'Connell, D ^a   Justice, J ^a   Durand, O ^b   Servet, B ^b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b THALES RESEARCH AND TECHNOLOGY   (France)

Author keywords

AFM; HfO2; Spectroscopic ellipsometry; Thin films; XRD; XRR

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CMOS INTEGRATED CIRCUITS; CRYSTALLIZATION; ELLIPSOMETRY; HAFNIUM COMPOUNDS; MELTING; NEUTRON ABSORPTION; SILICA; THERMAL EFFECTS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

CRYSTALLINE PHASE; PLASMA ION ASSISTED DEPOSITION (PIAD); SOLID PHASE CRYSTALLIZATION; X-RAY REFLECTOMETRY (XRR);

THIN FILMS;

EID: 15344348190     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.12.068     Document Type: Conference Paper

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