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Volumn 254, Issue 14, 2008, Pages 4396-4400

Surface characterization of TiO2 thin films obtained by high-energy reactive magnetron sputtering

Author keywords

Hot target; Pseudoepitaxy; Reactive sputtering; Rutile; Titanium dioxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 42649114439     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.01.017     Document Type: Article
Times cited : (46)

References (22)
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    • X-ray Diffraction Procedures
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    • D. Schmeisser P. Hoffman G. Beuckert E. Zschech C. Whelan T. Mikolajick Materials for Information Technology, Devices, Interconnects and Packaging. Series: Engineering Materials and Processes 2005 Springer
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    • Schmeisser, D.1    Hoffman, P.2    Beuckert, G.3
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    • 0343896778 scopus 로고
    • Powder Diffraction File, Joint Committee on Powder Diffraction Standards
    • Powder Diffraction File, Joint Committee on Powder Diffraction Standards 1967 ASTM Philadelphia, PA PDF Card 21-1276
    • (1967)
  • 17
    • 0343896778 scopus 로고
    • Powder Diffraction File, Joint Committee on Powder Diffraction Standards
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    • (1967)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.