The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering

Journal of Physics Condensed Matter

Volumn 20, Issue 17, 2008, Pages

  Field, M R ^a   McCulloch, D G ^a   Lim, S N H ^b   Anders, A ^c   Keast, V J ^d   Burgess, R W ^d  

^a RMIT UNIVERSITY   (Australia)

^b UNIVERSITY OF SYDNEY   (Australia)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d UNIVERSITY OF NEWCASTLE   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPY; ELECTRONIC STRUCTURE; MAGNETRON SPUTTERING; OXYGEN;

NEAR-EDGE FINE STRUCTURES; PULSED CATHODIC ARC DEPOSITION;

THIN FILMS;

EID: 42549126847     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/20/17/175216     Document Type: Article

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