Characterization of tungsten oxide films of different crystallinity prepared by RF sputtering

Physica B: Condensed Matter

Volumn 325, Issue , 2003, Pages 65-75

  Akl, A A ^a   Kamal, H ^b   Abdel Hady, K ^a  

^a Minia University ^*  (Egypt)

^b Ain Shams University   (Egypt)

Author keywords

Electrochromic materials; Sputtering; Tungsten oxide

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; CRYSTALLINE MATERIALS; FILM PREPARATION; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SUBSTRATES; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ELECTROCHROMIC MATERIALS;

THIN FILMS;

EID: 0037212226     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(02)01431-X     Document Type: Article

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