메뉴 건너뛰기




Volumn 44, Issue 9, 2008, Pages 598-599

X- and Ka-band power performance of AlGaN/GaN HEMTs grown by ammonia-MBE

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MOBILITY; GALLIUM NITRIDE; MOLECULAR BEAM EPITAXY;

EID: 42449083263     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20080669     Document Type: Article
Times cited : (15)

References (15)
  • 1
    • 0001473741 scopus 로고    scopus 로고
    • AlGaN/GaN HEMTs - An overview of device operation and applications
    • 10.1109/JPROC.2002.1021567 0018-9219
    • Mishra, U.K., Parikh, P., and Wu, Y.F.: ' AlGaN/GaN HEMTs - an overview of device operation and applications ', Proc. IEEE, 2002, 90, p. 1022-1031 10.1109/JPROC.2002.1021567 0018-9219
    • (2002) Proc. IEEE , vol.90 , pp. 1022-1031
    • Mishra, U.K.1    Parikh, P.2    Wu, Y.F.3
  • 5
    • 42449104472 scopus 로고    scopus 로고
    • Structural and morphological properties fo GaN buffer layers grown by ammonia molecular beam epitaxy on Sic substrates for AlGaN/GaN high electron mobility transistors
    • 0021-8979
    • Corrion, A., Poblenz, C., Wu, F., and Speck, J.S.: ' Structural and morphological properties fo GaN buffer layers grown by ammonia molecular beam epitaxy on Sic substrates for AlGaN/GaN high electron mobility transistors ', J. Appl. Phys., 2008, 103, (10) 0021-8979
    • (2008) J. Appl. Phys. , vol.103 , Issue.10
    • Corrion, A.1    Poblenz, C.2    Wu, F.3    Speck, J.S.4
  • 6
    • 17044452839 scopus 로고    scopus 로고
    • Influence of growth temperature and thickness of AlGaN caps on electron transport in AlGaN/GaN heterostructures grown by plasma assisted molecular beam epitaxy
    • 10.1143/JJAP.40.6235 0021-4922
    • Elsass, C.R., Poblenz, C., Heying, B., Fini, P., Petroff, P.M., DenBaars, S.P., Mishra, U.K., Speck, J.S., Saxler, A., Elhamrib, S., and Mitechel, W.C.: ' Influence of growth temperature and thickness of AlGaN caps on electron transport in AlGaN/GaN heterostructures grown by plasma assisted molecular beam epitaxy ', Jpn. J. Appl. Phys., 2001, 40, p. 6235-6238 10.1143/JJAP.40.6235 0021-4922
    • (2001) Jpn. J. Appl. Phys. , vol.40 , pp. 6235-6238
    • Elsass, C.R.1    Poblenz, C.2    Heying, B.3    Fini, P.4    Petroff, P.M.5    Denbaars, S.P.6    Mishra, U.K.7    Speck, J.S.8    Saxler, A.9    Elhamrib, S.10    Mitechel, W.C.11
  • 7
    • 0035914867 scopus 로고    scopus 로고
    • Role of Ga flux in dislocation reduction in GaN films grown on SiC (0001)
    • 10.1063/1.1421091 0003-6951
    • Lee, C.D., Sagar, A., Feenstra, R.M., Inoki, C.K., Kuan, T.S., Sarney, W.L., and Riba, L.S.: ' Role of Ga flux in dislocation reduction in GaN films grown on SiC (0001) ', Appl. Phys. Lett., 2001, 79, p. 3428-3430 10.1063/1.1421091 0003-6951
    • (2001) Appl. Phys. Lett. , vol.79 , pp. 3428-3430
    • Lee, C.D.1    Sagar, A.2    Feenstra, R.M.3    Inoki, C.K.4    Kuan, T.S.5    Sarney, W.L.6    Riba, L.S.7
  • 8
    • 36148941792 scopus 로고    scopus 로고
    • Power performance of AlGaN/GaN HEMTs grown on SiC by ammonia MBE at 4 and 10GHz
    • 10.1109/LED.2007.907266 0741-3106
    • Poblenz, C., Corrion, A.L., Recht, F., Suh, C., Chu, R., Shen, L., Speck, J.S., and Mishra, U.K.: ' Power performance of AlGaN/GaN HEMTs grown on SiC by ammonia MBE at 4 and 10GHz ', IEEE Electron Device Lett., 2007, 28, p. 945-947 10.1109/LED.2007.907266 0741-3106
    • (2007) IEEE Electron Device Lett. , vol.28 , pp. 945-947
    • Poblenz, C.1    Corrion, A.L.2    Recht, F.3    Suh, C.4    Chu, R.5    Shen, L.6    Speck, J.S.7    Mishra, U.K.8
  • 10
    • 31144466211 scopus 로고    scopus 로고
    • Uniformity and control of surface morphology during growth of GaN by molecular bean epitaxy
    • Poblenz, C., Waltereit, P., and Speck, J.S.: ' Uniformity and control of surface morphology during growth of GaN by molecular bean epitaxy ', J. Vac. Sci. Technol. B, 2005, 23, p. 1379-1385
    • (2005) J. Vac. Sci. Technol. B , vol.23 , pp. 1379-1385
    • Poblenz, C.1    Waltereit, P.2    Speck, J.S.3
  • 11
    • 9744231364 scopus 로고    scopus 로고
    • Effect of Al/N ratio during nucleation layer growth on Hall mobility and buffer leakage of molecular-beam epitaxy grown AlGaN/GaN heterostructures
    • 10.1063/1.1808496 0003-6951
    • Storm, D.F., Katzer, D.S., Binari, S.C., Shanabrook, B.V., Zhou, L., and Smith, D.J.: ' Effect of Al/N ratio during nucleation layer growth on Hall mobility and buffer leakage of molecular-beam epitaxy grown AlGaN/GaN heterostructures ', Appl. Phys. Lett., 2004, 85, p. 3786-3788 10.1063/1.1808496 0003-6951
    • (2004) Appl. Phys. Lett. , vol.85 , pp. 3786-3788
    • Storm, D.F.1    Katzer, D.S.2    Binari, S.C.3    Shanabrook, B.V.4    Zhou, L.5    Smith, D.J.6
  • 12
    • 27744499507 scopus 로고    scopus 로고
    • Rapod silicon outdiffusion from SiC substrates during molecular-bean epitaxial growth of AlGaN/GaN/AlN transistor structures
    • 0021-8979 1-5
    • Hoke, W.E., Torabi, A., Mosca, J.J., Hallock, R.B., and Kennedy, T.D.: ' Rapod silicon outdiffusion from SiC substrates during molecular-bean epitaxial growth of AlGaN/GaN/AlN transistor structures ', J. Appl. Phys., 2005, 98, p. 084510 1-5 0021-8979
    • (2005) J. Appl. Phys. , vol.98 , pp. 084510
    • Hoke, W.E.1    Torabi, A.2    Mosca, J.J.3    Hallock, R.B.4    Kennedy, T.D.5
  • 15
    • 36949032942 scopus 로고    scopus 로고
    • Deep submicron AlGaN/GaN HEMTs with ion implanted source/drain regions and nonalloyed ohmic contacts
    • 0013-5194
    • Pei, Y., Recht, F., Fichtenbaum, N.A., Keller, S., DenBaars, S.P., and Mishra, U.K.: ' Deep submicron AlGaN/GaN HEMTs with ion implanted source/drain regions and nonalloyed ohmic contacts ', Electron. Lett., 2007, 43, p. 1466-1467 0013-5194
    • (2007) Electron. Lett. , vol.43 , pp. 1466-1467
    • Pei, Y.1    Recht, F.2    Fichtenbaum, N.A.3    Keller, S.4    Denbaars, S.P.5    Mishra, U.K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.