Reliability characteristics of NiSi nanocrystals embedded in oxide and nitride layers for nonvolatile memory application

Applied Physics Letters

Volumn 92, Issue 15, 2008, Pages

  Chen, Wei Ren ^a   Chang, Ting Chang ^b   Yeh, Jui Lung ^a   Sze, S M ^a   Chang, Chun Yen ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIDES; OXIDES; RAPID THERMAL ANNEALING; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

CHARGE STORAGE ABILITY; NONVOLATILE NANOCRYSTALS MEMORY;

NANOCRYSTALS;

EID: 42349116747     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2905812     Document Type: Article

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