Structural homogeneity of nc-Si films grown by low-energy PECVD

Electrochemical and Solid-State Letters

Volumn 11, Issue 6, 2008, Pages

  Le Donne, A ^a   Binetti, S ^a   Isella, G ^b   Pizzini, S ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

NANOCRYSTALLINE SILICON; OPEN CIRCUIT VOLTAGE; RAMAN SPECTROSCOPY; SOLAR CELLS; THIN FILMS;

STRUCTURAL HOMOGENEITY; STRUCTURAL UNIFORMITY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 42349093720     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2894906     Document Type: Article

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