Full-chip based sub resolution assist features correction for mask manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Bang, Ju Mi ^a   Masumoto, Issei ^b   Ji, Min Kyu ^a   Jang, Sung Hoon ^a   Aburatani, Isao ^b   Choi, Ji Hyun ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a  

^a SAMSUNG Electronics   (South Korea)

^b NIPPON CONTROL SYSTEM Corporation   (Japan)

Author keywords

Data correction algorithm; Mask data preparation flow; Sizing technology; Sub Resolution Assist Features; Sub Resolution Assist Features CD linearity

Indexed keywords

ALGORITHMS; ERROR CORRECTION; IMAGE ENHANCEMENT; IMAGE RESOLUTION; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

DATA CORRECTION ALGORITHM; MASK DATA PREPARATION FLOW; SIZING TECHNOLOGY; SUB RESOLUTION ASSIST FEATURES (SRAF); SUB RESOLUTION ASSIST FEATURES CRITICAL DIMENSION (CD) LINEARITY;

MASKS;

EID: 42149149494     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746349     Document Type: Conference Paper

References (8)

1. ITRS 2006 update: public.itrs.net or etc.
2. Lori Joesten, Michael Reilly, Jason DeSisto, and Christiane Jehoul, "The effect of scattering bar assist features in 193nm lithography," Proc.SPIE, 4691, 861-870 (2002)
3. L. S. Melvin III, M. Drapeau, J. Huang, "Identification of sub-resolution assist features that are susceptible to imaging through process," Proc.SPIE, 6349, 63491Q(2006)
4. Chandra Sarma, "Optimal SRAF placement for process window enhancement in 65nm/45nm technology," Proc.SPIE, 6520, 65202B-1-65202B-7 (2007)
5. Byung-Sung Kim, "Size tolerance of sub-resolution assist features for sub-50 nm node device," Proc.SPIE, 6520, 652027-1-652027-7(2007)
6. Pat LaCour, "Model-Based OPC for Sub-Resolution Assist Feature Enhanced Layouts," Proc.SPIE, 4692, 540-546(2002)
7. Andreas Torsy, "Detailed Process Analysis for Sub-Resolution Assist Features Introdution," Proc.SPIE, 5377,1172-1183(2004)
8. PATACON manual, Nippon Control System