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Volumn 4691 II, Issue , 2002, Pages 861-870
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The effect of scattering bar assist features in 193 nm lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
LIGHTING;
MASKS;
OPTICAL RESOLVING POWER;
PROCESS CONTROL;
SCANNING;
SCATTERING BAR DESIGN;
PHOTOLITHOGRAPHY;
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EID: 0036410382
PISSN: 0277786X
EISSN: None
Source Type: Journal
DOI: 10.1117/12.474636 Document Type: Article |
Times cited : (5)
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References (2)
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