Model-based opc for sub-resolution assist feature enhanced layouts

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4692, Issue , 2002, Pages 540-546

  LaCour, Pat ^a   Pell, Ed ^a   Granik, Yuri ^a   Do, Thuy ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Mask constraints; Model based OPC; RET integration; SRAF

Indexed keywords

CALIBRATION; COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; MASKS; PHASE SHIFT; PHOTOLITHOGRAPHY;

OPTICAL PROXIMITY CORRECTION (OPC);

INTEGRATED CIRCUIT LAYOUT;

EID: 0036030774     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.475689     Document Type: Article

References (3)

1. Yuri Granik, Nick Cobb, and Thuy Do, "Universal Process Modeling with VTRE for OPC", SPIE 4691, 2002.
2. L. Liebmann, J. Bruce, et al., "Optimizing Style Options for Sub-Resolution Assist Features", SPIE 4346, 2001, pp. 141-152.
3. P. LaCour, E. Pell, et al., "Chip Level Line Width Prediction Methodology", SPIE 4692B, 2002.