Fabrication process development for superconducting VLSI circuits: Minimizing plasma charging damage

Journal of Physics: Conference Series

Volumn 97, Issue 1, 2008, Pages

  Tolpygo, Sergey K ^a,b   Amparo, Denis ^b  

^a HYPRES INC   (United States)

^b STONY BROOK UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 42149125488     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/97/1/012227     Document Type: Article

References (18)

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