Modeling of oxide charging effects in plasma processing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 552-559

  En, William ^a   Linder, Barry P ^a   Cheung, Nathan W ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2142685395     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588430     Document Type: Article

References (15)

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