Tunneling properties of barriers in Nb/Al/AlOx/Nb junctions

IEEE Transactions on Applied Superconductivity

Volumn 13, Issue 2 I, 2003, Pages 99-102

  Tolpygo, S K ^a   Cimpoiasu, E ^a   Liu, X ^a   Simonian, N ^a   Polyakov, Yu A ^a   Lukens, J E ^a   Likharev, K K ^a  

^a STONY BROOK UNIVERSITY   (United States)

Author keywords

Barrier height; Direct tunneling; Niobium trilayer junctions; Tunneling; WKB approximation

Indexed keywords

APPROXIMATION THEORY; ELECTRIC CONDUCTANCE; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRON TUNNELING; ERRORS; GROWTH (MATERIALS); NIOBIUM; NUMERICAL METHODS; WAVE EQUATIONS;

THERMAL GROWTH;

JOSEPHSON JUNCTION DEVICES;

EID: 0041942603     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2003.813655     Document Type: Conference Paper

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