Plasma process-induced damage to Josephson tunnel junctions in superconducting integrated circuits

Superconductor Science and Technology

Volumn 20, Issue 11, 2007, Pages

  Tolpygo, Sergey K ^a,b   Amparo, Denis ^b   Kirichenko, Alex ^a   Yohannes, Daniel ^a  

^a HYPRES INC   (United States)

^b STONY BROOK UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL CURRENTS; DIGITAL INTEGRATED CIRCUITS; PATTERN RECOGNITION; PLASMA APPLICATIONS; SUPERCONDUCTING ELECTRIC LINES;

FLOATING JUNCTIONS; PATTERN DEPENDENT DEVIATIONS; SUPERCONDUCTING DIGITAL INTEGRATED CIRCUITS;

TUNNEL JUNCTIONS;

EID: 36448972375     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/20/11/S09     Document Type: Conference Paper

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