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Volumn 6894, Issue , 2008, Pages

Recent progress of GaN electronic devices for wireless communication system

Author keywords

Base station; Distortion; Efficiency; FET; GaN; HEMT; High k; Millimeter wave; MIS; Power amplifier

Indexed keywords

AMPLIFIERS (ELECTRONIC); CELLULAR TELEPHONE SYSTEMS; COMMUNICATION; COMPUTER NETWORKS; CUBIC BORON NITRIDE; GALLIUM; GALLIUM ALLOYS; GALLIUM COMPOUNDS; GLOBAL SYSTEM FOR MOBILE COMMUNICATIONS; HIGH ELECTRON MOBILITY TRANSISTORS; MICROFLUIDICS; MOBILE COMPUTING; NITRIDES; PIGMENTS; SEMICONDUCTING GALLIUM; TELECOMMUNICATION SYSTEMS;

EID: 42149097721     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772152     Document Type: Conference Paper
Times cited : (10)

References (12)
  • 2
    • 42149146898 scopus 로고    scopus 로고
    • M. Kanamura, T. Kikkawa, N. Adachi, T. Kimura, S. Yokogawa, M. Nagahara, N. Hara and K. Joshin, AlGaN/GaN power HEMTs using surface-charge- controlled structure with recessed ohmic technique, 2003 Extended Abstracts of Inter. Conf. Solid State Devices and Materials, 916-917 (2003).
    • M. Kanamura, T. Kikkawa, N. Adachi, T. Kimura, S. Yokogawa, M. Nagahara, N. Hara and K. Joshin, "AlGaN/GaN power HEMTs using surface-charge- controlled structure with recessed ohmic technique," 2003 Extended Abstracts of Inter. Conf. Solid State Devices and Materials, 916-917 (2003).
  • 5
    • 33847726230 scopus 로고    scopus 로고
    • An over 100 W n-GaN/n-AlGaN/GaN MIS-HEMT power amplifier for W-CDMA base station applications
    • M. Kanamura, T. Kikkawa, T. Iwai, K. Imanishi, T. Kubo and K. Joshin, "An over 100 W n-GaN/n-AlGaN/GaN MIS-HEMT power amplifier for W-CDMA base station applications," IEEE IEDM Tech. Dig., 581-584 (2005).
    • (2005) IEEE IEDM Tech. Dig , vol.581-584
    • Kanamura, M.1    Kikkawa, T.2    Iwai, T.3    Imanishi, K.4    Kubo, T.5    Joshin, K.6
  • 9
    • 34547187720 scopus 로고    scopus 로고
    • K. Makiyama, T. Ohki, M. Kanamura, K. Imanishi, N. Hara and T. Kikkawa, High-fmax GaN HEMT with high breakdown voltage over 100 V for millimeter-wave applications, Int. Workshop on Nitride Semiconductors, Kyoto, Oct. 2054-2058 (2006), Phys. Status .Solidi (a) 204 , 2054-5059 (2007).
    • K. Makiyama, T. Ohki, M. Kanamura, K. Imanishi, N. Hara and T. Kikkawa, "High-fmax GaN HEMT with high breakdown voltage over 100 V for millimeter-wave applications," Int. Workshop on Nitride Semiconductors, Kyoto, Oct. 2054-2058 (2006), Phys. Status .Solidi (a) 204 , 2054-5059 (2007).
  • 10
    • 33744826295 scopus 로고    scopus 로고
    • Field-plated 0.25-μm gate-length AlGaN/GaN HEMTs with varying field-plate length
    • V. Kumar, G. Chen, S. Guo and I. Adesida, "Field-plated 0.25-μm gate-length AlGaN/GaN HEMTs with varying field-plate length," IEEE Trans. Electron Devices, 53, 1477-1480 (2006).
    • (2006) IEEE Trans. Electron Devices , vol.53 , pp. 1477-1480
    • Kumar, V.1    Chen, G.2    Guo, S.3    Adesida, I.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.