Adsorption and deposition of anthraquinone-2-carboxylic acid on alumina studied by inelastic electron tunneling spectroscopy, infrared reflection absorption spectroscopy, X-ray photoelectron spectroscopy, and atomic force microscopy

Applied Surface Science

Volumn 254, Issue 13, 2008, Pages 3829-3838

  Higo, Morihide ^a   Miake, Takeshi ^a   Mitsushio, Masaru ^a   Yoshidome, Toshifumi ^a   Ozono, Yoshihisa ^a  

^a KAGOSHIMA UNIVERSITY   (Japan)

Author keywords

Adsorption; Alumina; Anthraquinone 2 carboxylic acid; Atomic force microscopy; Deposition; Inelastic electron tunneling spectroscopy; Infrared reflection absorption spectroscopy; X ray photoelectron spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; ALUMINA; ATOMIC FORCE MICROSCOPY; CONCENTRATION (PROCESS); SCANNING TUNNELING MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ANTHRAQUINONE-2-CARBOXYLIC ACID; INELASTIC ELECTRON TUNNELING SPECTROSCOPY; INFRARED REFLECTION ABSORPTION SPECTROSCOPY;

CARBOXYLIC ACIDS;

EID: 41749089163     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.12.004     Document Type: Article

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