SCOPUS 정보 검색 플랫폼

Analytical Sciences

Volumn 18, Issue 3, 2002, Pages 227-242

Characterization of metal oxide surfaces and thin semiconductor films by inelastic electron tunneling spectroscopy

(2) Higo, Morihide a Kamata, Satsuo a

a KAGOSHIMA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; AMIDES; CHEMICAL ANALYSIS; ELECTRON TUNNELING; GERMANIUM COMPOUNDS; MAGNESIA; METALS; OXIDE FILMS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR JUNCTIONS; SOLID-STATE SENSORS; SPECTROSCOPY;

CRYOGENIC TEMPERATURES; INELASTIC ELECTRON TUNNELING SPECTROSCOPY; METAL OXIDE SURFACES; STRUCTURES AND PROPERTIES; SURFACE AND INTERFACES; SURFACE CHARACTERIZATION; THIN SEMICONDUCTOR FILMS; TUNNELING JUNCTIONS;

SURFACE REACTIONS;

ALUMINUM OXIDE; AMIDE; CARBOXYLIC ACID; ESTER DERIVATIVE; GERMANIUM; MAGNESIUM OXIDE; METAL OXIDE; SILICON;

ADSORPTION; ANALYTIC METHOD; CATALYST; CHEMICAL REACTION; FILM; REVIEW; SEMICONDUCTOR; SENSOR; SPECTROSCOPY; SURFACE PROPERTY; VIBRATION;

EID: 0036224287 PISSN: 09106340 EISSN: None Source Type: Journal
DOI: 10.2116/analsci.18.227 Document Type: Review

Times cited : (12)

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