Anthraquinone-2-carboxylic acid deposited from solution onto native oxide surfaces of Al films characterized by inelastic electron tunneling spectroscopy, X-ray photoelectron spectroscopy, and atomic force microscopy

Chemistry Letters

Volumn 35, Issue 1, 2006, Pages 48-49

  Higo, Morihide ^a   Miake, Takeshi ^a   Mitsushio, Masaru ^a   Yoshidome, Toshifumi ^a   Ozono, Yoshihisa ^a  

^a KAGOSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33645121979     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2006.48     Document Type: Article

References (8)

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2. M. Higo, Bunseki Kagaku 2001, 50, 637.
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4. M. Osawa, K. Ataka, K. Yoshii, T. Yotsuyanagi, J. Electron Spectrosc. Relat. Phenom. 1993, 64-65, 371.
5. S. W. Han, T. H. Ha, C. H. Kim, K. Kim, Langmuir 1998, 14, 6113.
6. S. W. Han, S. W. Joo, T. H. Ha, Y. Kim, K. Kim, J. Phys. Chem. 2000, B104, 11987.
7. M. Higo, X. Lu, U. Mazur, K. W. Hipps, Thin Solid Films 2001, 384, 90.
8. M. Higo, T. Futagawa, M. Mitsushio, T. Yoshidome, Y. Ozono, J. Phys. Chem. 2003, B107, 5871.