Non-ambient X-ray diffraction residual stress analysis of thin films: Tracing nanosize-related effects on thermoelastic constants and identifying sources of residual stresses

Journal of Applied Crystallography

Volumn 41, Issue 2, 2008, Pages 428-435

  Kuru, Yener ^a   Wohlschlögel, Markus ^a   Welzel, Udo ^a   Mittemeijer, Eric J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Metals; Nanoscale; Stress strain relationships; X ray diffraction

Indexed keywords

EID: 40849133985     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889808004792     Document Type: Article

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