Stress, texture, and microstructure in niobium thin films sputter deposited onto amorphous substrates

Journal of Applied Physics

Volumn 95, Issue 2, 2004, Pages 466-476

  Okolo, B ^a   Lamparter, P ^a   Welzel, U ^a   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; COMPOSITION; COMPRESSIVE STRESS; GRAIN GROWTH; ION BEAMS; MAGNETRON SPUTTERING; NIOBIUM; STRAIN; TEXTURES; TWINNING; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FOCUSED ION BEAM IMAGING; MICROSTRAIN; X-RAY REFLECTOMETRY;

THIN FILMS;

EID: 0742284416     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1631733     Document Type: Article

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