X-ray diffraction and reflectometry investigation of interdiffusion in sputtered niobium-tungsten bilayers

Materials Research Society Symposium - Proceedings

Volumn 562, Issue , 1999, Pages 147-152

  Welzel, U ^a   Lamparter, P ^a   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; INTERDIFFUSION (SOLIDS); MICROSTRUCTURE; MULTILAYERS; NIOBIUM; REFLECTOMETERS; SPUTTER DEPOSITION; STRESS ANALYSIS; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

X RAY REFLECTOMETRY;

METALLIC FILMS;

EID: 0033327254     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-562-147     Document Type: Conference Paper

References (11)