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Physical Review Letters

Volumn 100, Issue 7, 2008, Pages

Resonant interferometric lithography beyond the diffraction limit

(3) Kiffner, M a Evers, J a Zubairy, M S a,b,c

a MAX PLANCK INSTITUT FÜR KERNPHYSIK (Germany)

b TEXAS A AND M UNIVERSITY (United States)

c TEXAS A AND M UNIVERSITY AT QATAR (Qatar)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; INTERFEROMETRY; PHASE SHIFT; RESONANCE; STANDING WAVE METERS;

LASER INTENSITIES; RESONANT INTERFEROMETRIC LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 40849089511 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.100.073602 Document Type: Article

Times cited : (89)

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