Adherent amorphous hydrogenated carbon films on metals deposited by plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 4011-4017

  Capote, G ^a   Bonetti, L F ^a,b   Santos, L V ^a   Trava Airoldi, V J ^a   Corat, E J ^a  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

^b INSTITUTO TECNOLÓGICO DE AERONÁUTICA   (Brazil)

Author keywords

Adhesion; Amorphous hydrogenated carbon; Mechanical properties; Plasma enhanced chemical vapor deposition; Silicon interlayer; X ray photoelectron spectra

Indexed keywords

ADHESION; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS HYDROGENATED CARBON; SILICON INTERLAYER;

CARBON FILMS;

EID: 40749160361     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.08.007     Document Type: Article

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