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Volumn 254, Issue 11, 2008, Pages 3282-3287

Electroless deposition of copper and fabrication of copper micropatterns on CVD diamond film surfaces

Author keywords

Copper micropattern; Diamond; Electrochemical; Electroless deposition; Glucose

Indexed keywords

ADHESION; CATALYSTS; CHEMICAL VAPOR DEPOSITION; CYCLIC VOLTAMMETRY; DIAMOND FILMS; ELECTROLESS PLATING; GLUCOSE; NANOPARTICLES;

EID: 39849095071     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.11.008     Document Type: Article
Times cited : (14)

References (24)
  • 11
    • 39849084698 scopus 로고    scopus 로고
    • Practical Electroless Plating Techonology
    • N. Li Practical Electroless Plating Techonology 2004 Chemical Industry Press Beijing, P.R. China pp. 145–148
    • (2004)
    • Li, N.1
  • 12
    • 85120226065 scopus 로고    scopus 로고
    • M. Gulla, W.A. Conlan, US Patent 3,874,882 (1975).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.