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Diamond and Related Materials

Volumn 13, Issue 11-12, 2004, Pages 2003-2008

Electroanalytical application of modified diamond electrodes

(5) Ivandini, Tribidasari A a Sato, Rika a Makide, Yoshihiro b Fujishima, Akira c Einaga, Yasuaki a

a KEIO UNIVERSITY (Japan)

b UNIVERSITY OF TOKYO (Japan)

c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY (Japan)

Author keywords

Chemical electrodes; Diamond electrodes; Electrochemical analysis; Ion implantation; Metal modified electrodes; Sensors

Indexed keywords

BORON; DOPING (ADDITIVES); ELECTROCHEMISTRY; ELECTRODES; HEAVY IONS; ION IMPLANTATION; SENSITIVITY ANALYSIS; SENSORS; SILICON WAFERS; ULTRASONIC TESTING;

BORON-DOPED DIAMOND; CHEMICAL ELECTRODES; DIAMOND ELECTRODES; ELECTROCHEMICAL ANALYSIS; METAL-MODIFIED ELECTRODES;

DIAMONDS;

EID: 7544229432 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/j.diamond.2004.07.004 Document Type: Conference Paper

Times cited : (70)

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