Etching of n-Si(111) in 40% NH4F solution investigated by OCP, in Situ EC-STM, and ATR-FTIR spectroscopic methods

Journal of Physical Chemistry C

Volumn 112, Issue 5, 2008, Pages 1533-1538

  Bae, Sang Eun ^a   Yoon, Jung Hyun ^a   Lee, Chi Woo J ^a  

^a Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL ELECTRODES; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY;

ATTENUATED TOTAL REFLECTION-FOURIER TRANSFORM INFRARED (ATR-FTIR) SPECTROSCOPY; ELECTROCHEMICAL-SCANNING TUNNELING MICROCOPY;

SILICON;

EID: 39649112419     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp076673m     Document Type: Article

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