Impact of O 2 exposure on surface crystallinity of clean and Ba terminated Ge(1 0 0) surfaces

Applied Surface Science

Volumn 254, Issue 9, 2008, Pages 2720-2724

  Cattoni, A ^a   Bertacco, R ^a   Cantoni, M ^a   Ciccacci, F ^a   Von Kaenel, H ^a   Norga, G J ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

Ba; Ge; Oxide epitaxy; RHEED; Surface passivation; Surface termination; XPS

Indexed keywords

BARIUM; CLEANING; CRYSTAL STRUCTURE; OXYGEN; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SURFACE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE PASSIVATION; SURFACE TERMINATION; TERMINATION LAYERS;

GERMANIUM COMPOUNDS;

EID: 38949146405     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.10.018     Document Type: Article

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