Nanocrystalline silicon thin films deposited by high-frequency sputtering at low temperature

Solar Energy Materials and Solar Cells

Volumn 86, Issue 1, 2005, Pages 135-144

  Zhao, Z X ^a   Cui, R Q ^a   Meng, F Y ^a   Zhou, Z B ^a   Yu, H C ^a   Sun, T T ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Heterojunction solar cell; High frequency sputtering; Hydrogenated nanocrystalline silicon; Low temperature

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FILM GROWTH; HETEROJUNCTIONS; HYDROGENATION; INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; SOLAR CELLS; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

HETEROJUNCTION SOLAR CELLS; HIGH-FREQUENCY SPUTTERING; HYDROGENATED NANOCRYSTALLINE SILICON; LOW TEMPERATURE;

SILICON;

EID: 10444280216     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.05.025     Document Type: Article

References (21)

1. G. Cicala, P. Capezzuto, G. Bruno, Thin Solid Films 337 (1999) 59-62.
2. A.M. Ali, T. Inokuma, Y. Kurata, S. Hasegawa, Mater. Sci. Eng. C 15 (2001) 125-128.
3. I-Chun Cheng, S. Wagner, Thin Solid Films 427 (2003) 56-59.
4. J. Meier, R. Flückiger, H. Keppner, A. Shah, Appl. Phys. Lett. 65 (1994) 860.
5. Y. Chen, S. Wagner, Appl. Phys. Lett. 75 (1999) 1125.
6. S.C. Saha, R. Swati, J. Appl. Phys. 78 (1995) 5713.
7. P. Rocai Cabarrocas, J. Non-Cryst. Solids. (2000) 266-269.
8. J. Müller, F. Finger, R. Carius, H. Wagner, Phys. Rev. B 60 (1999) 11666.
9. A. Achiq, R. Rizk, F. Gourbilleau, P. Voivenel, Thin Solid Films 348 (1999) 74.
10. K. Yamamoto, T. Suzuki, M. Yoshimi, A. Nakajima, 14th PVSEC, WIP, Munchen, 1997, p. 1018.
11. G. Grabosch, D. Borchert, R. Hussein, W.R. Fahmer, 14th PVSEC, WIP, Munchen, 1997, p. 1472.
12. E. Conrad, L. Elstner, W. Fuhs, W. Henrion, P. Muller, B. Selle, 14th PVSEC, WIP, Munchen, 1997, p. 1411.
13. H. Xia, Y.L. He, L.C. Wang, M. Zhang, X.N. Liu, X.K. Zhang, D. Feng, H.E. Jackson, J. Appl. Phys. 78 (1995) 6705.
14. Y.L. He, C.Z. Yin, G.X. Cheng, L.C. Wang, X.N. Liu, G.Y. Hu, J. Appl. Phys. 75 (1994) 797.
15. H.P. Klung, L.E. Alexander, X-ray Diffraction Procedures, Wiley, New York, 1974.
16. G. Cicala, P. Capezzuto, G. Bruno, L. Schiavulli, G. Perna, V. Capozzi, J. Appl. Phys. 80 (1996) 6564.
17. U. Kroll, J. Meier, A. Shah, S. Mikhailov, J. Weber, J. Appl. Phys. 80 (1996) 4971.
18. G.Y. Xu, T.M. Wang, G.H. Li, J.L. Wang, J.L. He, Z.X. Ma, G.Z. Zheng, Chin. J. Semicond. 21 (2000) 1170.
19. Ch. Ossadnik, S. Veprek, I. Gregora, Thin Solid Films 337 (1999) 148-156.
20. R.E.I. Schropp, M. Zeman, Amorphous and Microcrystalline Silicon Solar Cells, Kluwer Academic Publishers, Boston, 1988.
21. J. Tauc, in: J. Tauc (Ed.), Photo and Thermal Electric Effects in Semiconductors, Pergamon, New York, 1962.