Structural, morphological, electrical and luminous properties of undoped micro/nanocrystalline silicon films deposited by ion-assisted beam deposition techniques

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 112, Issue 1-4, 1996, Pages 289-293

  Khan, H R ^a   Frey, H ^b   Banhart, F ^c  

^a Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem   (Germany)

^b Lot und Schweissgerate GmbH   (Germany)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CRYSTAL ORIENTATION; DEPOSITION; GLASS; INTERFACES (MATERIALS); ION BEAMS; SILICON; STAINLESS STEEL; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ION ASSISTED BEAM DEPOSITION; MICROCRYSTALLINE SILICON; NANOCRYSTALLINE SILICON;

NANOSTRUCTURED MATERIALS;

EID: 0030563529     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01425-X     Document Type: Article

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