Highly conductive and highly transparent n-type microcrystalline silicon thin films

Thin Solid Films

Volumn 303, Issue 1-2, 1997, Pages 47-52

  Martins, R ^a   Macarico A ^a   Ferreira, I ^a   Nunes, R ^a   Bicho, A ^a   Fortunato, E ^a  

^a DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

Author keywords

Electrical properties and measurements; Hall effect; Raman scattering; Silicon

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; ENERGY GAP; HALL EFFECT; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; SOLAR CELLS; THIN FILM TRANSISTORS; THIN FILMS; TRANSPARENCY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

CONDUCTIVE FILMS;

EID: 0031189816     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00087-4     Document Type: Article

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