Advanced process control of the critical dimension in photolithography

International Journal of Precision Engineering and Manufacturing

Volumn 9, Issue 1, 2008, Pages 12-18

  Wu, Chien Feng ^a   Hung, Chih Ming ^a   Chen, Juhn Horng ^b   Lee, An Chen ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b CHUNG HUA UNIVERSITY   (Taiwan)

Author keywords

Dynamic model tuning minimum variance (DMTMV) controller; Nonlinear multiple exponential weight moving average controller; Photolithography process; Run to run (R2R) controller

Indexed keywords

EID: 38949089244     PISSN: 12298557     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)

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