Yield enhancement in photolithography through model-based process control: Average mode control

IEEE Transactions on Semiconductor Manufacturing

Volumn 18, Issue 1, 2005, Pages 86-93

  Grosman, Benyamin ^a   Lachman Shalem, Sivan ^a   Swissa, Raaya ^b   Lewin, D R ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b Tower Semiconductors Ltd ^*  (Israel)

Author keywords

Genetic programming; Model predictive control; Multivariable control; Photolithography CD control; Process modeling

Indexed keywords

CALIBRATION; MATHEMATICAL MODELS; MATHEMATICAL PROGRAMMING; MULTIVARIABLE CONTROL SYSTEMS; PROCESS CONTROL; SEMICONDUCTOR MATERIALS;

CD CONTROL; GENETIC PROGRAMMING; MODEL PREDICTIVE CONTROL; MULTIVARIABLE CONTROL; PROCESS MODELING;

PHOTOLITHOGRAPHY;

EID: 13844297666     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.836654     Document Type: Article

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