Statistical analysis of CD SEM measurement and process control in the indistinguishable multi-process patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Yang, Duck Sun ^a   Jung, Myung Ho ^a   Lee, Young Mi ^a   Koh, Cha Won ^a   Yeo, Gi Sung ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a   Moon, Joo Tae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

CD; CD difference; Indistinguishable pattern; Total variance

Indexed keywords

ETCHING; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; STATISTICAL METHODS;

CD DIFFERENCE; INDISTINGUISHABLE PATTERN; TOTAL VARIANCE;

LITHOGRAPHY;

EID: 33745625326     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656058     Document Type: Conference Paper

References (1)

1. M. Maenhoudt, J. Versluijs, H. Struyf, J. Van Olmen, M. Van Hove," Double Patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ=193nm Proc. SPIE Vol. 5754, p1508 (2005)