SCOPUS 정보 검색 플랫폼

Volumn 26, Issue 1, 2008, Pages 122-127

Fabrication of silicon kinoform lenses for hard x-ray focusing by electron beam lithography and deep reactive ion etching

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-QUALITY OPTICS; KINOFORM LENSES; NANOMETER SPOT SIZES; SERIAL STACKS;

CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; LENSES; OPTICAL RESOLVING POWER; REACTIVE ION ETCHING;

SILICON;

EID: 38849125660 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.2825167 Document Type: Article

Times cited : (28)

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