Formation of nanometer-scale gaps between metallic electrodes using pulse/DC plating and photolithography

Materials Science and Engineering C

Volumn 23, Issue 6-8, 2003, Pages 833-839

  Lee, Y ^a   Jo, Y S ^a   Roh, Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Electrochemical; Electrode; Electroplating; Nanostructure; Photolithography

Indexed keywords

ELECTRODES; ELECTROPLATING; GOLD; MASKS; PHOTOLITHOGRAPHY; ROBUSTNESS (CONTROL SYSTEMS);

METALLIC ELECTRODES; NANOMETER-SCALE GAPS;

NANOTECHNOLOGY;

COATING; ELECTROPLATING; PROCESSING TECHNIQUE; SILVER; SOLID LUBRICANT;

EID: 0344256496     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2003.09.105     Document Type: Article

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