Wafer cleaning using supercritical CO2 in semiconductor and nanoelectronic device fabrication

Solid State Phenomena

Volumn 134, Issue , 2008, Pages 97-103

  Saga, Koichiro ^a   Hattori, Takeshi ^a  

^a SONY CORPORATION   (Japan)

Author keywords

NEMS; Photoresist stripping; Silicon dioxide etching

Indexed keywords

EID: 38549135502     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (15)

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