Fabrication of poly(tetrafluoroethylene) microparts by high-energy X-ray-induced etching

Japanese Journal of Applied Physics

Volumn 47, Issue 1, 2008, Pages 337-341

  Ukita, Yoshiaki ^a   Kishihara, Mitsuyoshi ^b   Kanda, Kazuhiro ^a   Matsui, Shinji ^a   Mochui, Kozo ^a   Utsumi, Yuichi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b OKAYAMA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

High aspect ratio microstructure; Microfluidics; Photochemistry; Poly(tetrafluoroethylene)

Indexed keywords

ETCHING; FABRICATION; FLOW OF FLUIDS; PHOTOCHEMICAL REACTIONS; POLYTETRAFLUOROETHYLENES; X RAYS;

BUBBLE STRUCTURE; HIGH-ASPECT-RATIO MICROSTRUCTURE; STENCIL MASKS; X-RAY-INDUCED ETCHING;

MICROFLUIDICS;

EID: 38549109496     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.337     Document Type: Article

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