High quality ion-induced secondary electron imaging for MeV nuclear microprobe applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 560-564

  Teo, E J ^a   Breese, M B H ^a   Bettiol, A A ^a   Watt, F ^a   Alves, L C ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; ELECTRONS; MAGNETIC FLUX; OPTIMIZATION; PHOTOMULTIPLIERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SIGNAL TO NOISE RATIO; SINGLE CRYSTALS; SURFACE TOPOGRAPHY; VAN DE GRAAFF ACCELERATORS;

ELECTRON FLUX; ELECTRON IMAGING; VOLTAGE MODULATED IMAGES; VOLTAGE STABILITY;

IMAGE QUALITY;

EID: 2342509631     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1651549     Document Type: Article

References (17)

1. P. A. Younger and J. A. Cookson, Nucl. Instrum. Methods 158, 193 (1979).
2. L. C. Alves, M. B. H. Breese, M. F. da Silva, and J. C. Soares, Nucl. Instrum. Methods Phys. Res. B 188, 146 (2002).
3. M. Takai, Y. Agawa, K. Ishibashi, K. Hirai, S. Namba, K. Inoue, and Y. Kawata, Nucl. Instrum. Methods Phys. Res. B 54, 279 (1991).
4. G. W. Grime, M. Dawson, M. Marsh, I. C. McArthur, and F. Watt, Nucl. Instrum. Methods Phys. Res. B 54, 52 (1991).
5. H. Kneis, B. Martin, R. Nobiling, B. Povh, and K. Traxel, Nucl. Instrum. Methods Phys. Res. 197, 79 (1982).
6. M. B. H. Breese, J. A. Cookson, J. A. Coyle, and A. E. Ledbury, Nucl. Instrum. Methods Phys. Res. B 54, 12 (1991).
7. E. J. Teo, M. Alkaisi, A. A. Bettiol, T. Osipowicz, J. Van. Kan, F. Watt, and A. Markwitz, Nucl. Instrum. Methods Phys. Res. B 190, 339 (2002).
8. F. Watt, J. A. van Kan, I. Rajta, A. A. Bettiol, T. F. Choo, M. B. H. Breese, and T. Osipowicz, Nucl. Instrum. Methods Phys. Res. B 210, 14 (2003).
9. J. C. H. Phang, K. K. W. Ong, D. S. H. Chan, T. S. Low, and N. F. Ng, Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, edited by D. Chan, K. P. Lim, and T. S. Low (IEEE Singapore, Singapore, 1987), pp. 50-61.
10. D. J. W. Mous, R. G. Haitsma, T. Butz, R.-H. Flaymeyer, D. Lehmann, and J. Vogt, Nucl. Instrum. Methods Phys. Res. B 130, 31 (1997).
11. F. Watt, I. Orlic, K. K. Loh, C. H. Sow, P. Thong, S. C. Liew, T. Osipowicz, T. F. Choo, and S. M. Tang, Nucl. Instrum. Methods Phys. Res. B 85, 708 (1994).
12. G. W. Grime and M. Dawson, Nucl. Instrum. Methods Phys. Res. B 89, 223 (1994).
13. E. J. Teo, A. A. Bettiol, C. N. B. Udalagama, and F. Watt, Nucl. Instrum. Methods Phys. Res. B 210, 501 (2003).
14. V. S. Vavilov, A. A. Gippius, A. M. Zaitsev, B. V. Deryagin, B. V. Spitsyn, and A. E. Aleksenko, Sov. Phys. Semicond. 14, 1078 (1990).
15. L. H. Robbins, L. P. Cook, E. N. Farabaugh, and A. Feldman, Phys. Rev. B 39, 13367 (1989).
16. H. Kanda, K. Watanabe, S. Koizumi, and T. Teraji, Diamond Relat. Mater. 12, 20 (2003).
17. R. J. Graham and K. V. Ravi, Appl. Phys. Lett. 60, 1310 (1992).