Effects of shifter edge topography on through focus performance

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 827-837

  Hotta, S ^a   Pistor, T V ^a   Adams, K ^a   Neureuther, A R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Diffraction order; Fourier transform; Intensity imbalance; Mask topography; Phase error; Phase shifting mask

Indexed keywords

COMPUTER SIMULATION; CROSSTALK; DIFFRACTION; FOURIER TRANSFORMS; IMAGING TECHNIQUES; PHOTOLITHOGRAPHY;

SHIFTER EDGE TOPOGRAPHY;

MASKS;

EID: 0035043110     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410765     Document Type: Article

References (9)

1. Improving resolution in photolithography with a phase-shifting mask
2. The phase-shifting mask II: Imaging simulations and submicrometer resist exposures
3. Phase-shifting mask topography effects on lithographic image quality
4. Mask topography effects in projection printing of phase shift masks
5. Analysis of nonplanar topography effects of phase shift masks on imaging characteristics
6. Design and analysis of manufacturable alternating phase-shifting masks
7. Rigorous diffraction analysis for future mask topography
8. Optimizing edge topography of alternating phase shift masks using rigorous mask modeling