Optimizing edge topography of alternating phase shift masks using rigorous mask modelling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Friedrich, Christoph ^a   Mader, Leonhard ^a   Erdmann, Andreas ^a   List, Steffen ^a   Gordon, Ron ^a   Kalus, Christian ^a   Griesinger, Uwe ^a   Pforr, Rainer ^a   Mathuni, Josef ^a   Ruhl, Guenther ^a   Maurer, Wilhelm ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFECTS; MASKS; QUARTZ; ULTRAVIOLET RADIATION;

CRITICAL DIMENSION (CD); MASK TOPOGRAPHY EFFECTS; PHASE ERRORS; PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0033682525     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)