Monolayer incorporation of nitrogen at Si-SiO2 interfaces: Interface characterization and electrical properties

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 356-364

  Lucovsky, Gerald ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032358627     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581005     Document Type: Article

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