Ultrathin oxide gate dielectrics prepared by low temperature remote plasma-assisted oxidation

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1529-1533

  Niimi, H ^a   Lucovsky, G ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

N atom; Plasma assisted oxidation; Si SiO2interfaces

Indexed keywords

EID: 0041781223     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00389-7     Document Type: Article

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