Actinic EUVL mask blank defect inspection system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 298-308

  Jeong, Seongtae ^a   Johnson, Lewis ^a   Lin, Yun ^a   Rekawa, Seno ^a   Yan, Pei Yan,g ^a   Kearney, Patrick A ^a   Tejnil, Edita ^a   Underwood, James H ^a   Bokor, Jeffrey ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; INSPECTION; MASKS; SENSITIVITY ANALYSIS; SUBSTRATES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MASK BLANK DEFECT INSPECTION SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 0032624065     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351101     Document Type: Conference Paper

References (10)