Surface conditioning solutions to reduce resist line roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 801-806

  Zhang, Peng ^a   Jaramillo Jr , Manuel ^a   Rao, Madhukar B ^a   Yates, Colin ^b   King, Danielle M ^a   Ross, Brenda F ^a   O'Brien, Bridget L ^a  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

Line width roughness (LWR); Pattern collapse; Surface conditioning solution

Indexed keywords

DIFFUSION; LITHOGRAPHY; MOLECULAR WEIGHT; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SURFACE ROUGHNESS; SURFACE TREATMENT;

LINE WIDTH ROUGHNESS (LWR); PATTERN COLLAPSE; SURFACE CONDITIONING SOLUTION;

LASER OPTICS;

EID: 3843094856     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535819     Document Type: Conference Paper

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