Line edge roughness and development rate analysis based on random reaction/percolation model for chemically amplified resists

Journal of Photopolymer Science and Technology

Volumn 15, Issue 3, 2002, Pages 389-394

  Fukuda, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Chemically amplified resist; Diffusion; Line edge roughness; Percolation

Indexed keywords

ACID;

ARTICLE; DIFFUSION; LINE EDGE ROUGHNESS; LITHOGRAPHY; MOLECULAR SIZE; SCANNING ELECTRON MICROSCOPY; SOLUBILITY; TECHNOLOGY;

EID: 0036368554     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.389     Document Type: Article

References (6)