Photosensitive co-polycarbonates for use as sacrificial materials in the fabrication of microfluidic and microelectromechanical devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 850-860

  White, Celesta E ^a   Henderson, Clifford L ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Photoacid generator; Photosensitive; Polycarbonate; Sacrificial material

Indexed keywords

PHOTOACID GENERATORS; POLYMER STRUCTURE; SACRIFICIAL MATERIALS;

CHEMICAL BONDS; DNA SEQUENCES; INTEGRATED CIRCUITS; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MOLECULAR WEIGHT; PHOTOSENSITIVITY; X RAY DIFFRACTION;

POLYCARBONATES;

EID: 3843079545     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534332     Document Type: Conference Paper

References (18)

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