Multifractal analysis of ITO thin films prepared by electron beam deposition method

Applied Surface Science

Volumn 254, Issue 7, 2008, Pages 2168-2173

  Raoufi, Davood ^a,b   Fallah, Hamid Reza ^a   Kiasatpour, Ahmad ^a   Rozatian, Amir Sayid Hassan ^a  

^a UNIVERSITY OF ISFAHAN   (Iran)

^b BU ALI SINA UNIVERSITY   (Iran)

Author keywords

Electron beam evaporation; ITO thin film; Multifractal analysis; Surface roughness

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITION; SEMICONDUCTING INDIUM COMPOUNDS; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY;

ANNEALING TEMPERATURES; ELECTRON BEAM DEPOSITION; MULTIFRACTAL ANALYSIS;

THIN FILMS;

EID: 37749024867     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.09.015     Document Type: Article

References (37)

1. Bessais B., Ezzaouia H., and Bennaceur R. Semicond. Sci. Technol. 8 (1993) 1671
2. Kim H., Gilmore C.M., Pique A., Horwitz J.S., Mattoussi H., Murata H., Kafafi Z.H., and Chrisey D.B. J. Appl. Phys. 86 11 (1999) 6451
3. Deng W., Ohgi T., Nejo H., and Fujita D. Appl. Phys. A: Mater. Sci. Process. 72 5 (2001) 595
4. Hu Y.L., Diao X.G., Wang C., Hao W.C., and Wang T.M. Vacuum 75 2 (2004) 183
5. El Rhaleb H., Benamar E., Rami M., Roger J.P., Hakam A., and Ennaoui A. Appl. Surf. Sci. 201 1-4 (2002) 138
6. Kim S.S., Choi S.Y., Park C.G., and Jin H.W. Thin Solid Films 347 1-2 (1999) 155
7. Fallah H.R., Ghasemi M., Hassanzadeh A., and Steki H. Physica B 373 (2006) 274
8. Raoufi D., Kiasatpour A., Fallah H.R., and Rozatian A.S.H. Appl. Surf. Sci. 253 23 (2007) 9085
9. Tak Y.H., Kim K.B., Park H.G., Lee K.H., and Lee J.R. Thin Solid Films 411 1 (2002) 12
10. Jonda C., Mayer A.B.R., Stolz U., Elschner A., and Karbach A. J. Mater. Sci. 35 22 (2000) 5645
11. Chaudhari A., Yan C.C., and Lee S.L. Appl. Surf. Sci. 238 (2004) 513
12. Barabasi A.L., and Stanly H.E. Fractal Concepts in Surface Growth (1995), Cambridge University Press, Cambridge
13. Vicsek T. Fractal Growth Phenomena (1988), World Scientific Publishers, Singapore
14. Jahn R., and Truckenbrodt H. J. Mater. Process. Technol. 145 (2004) 40
15. Ba L., Zen J., Zhang S., and Wu Z. J. Appl. Phys. 77 (1995) 587
16. Almqvist N. Surf. Sci. 355 (1996) 221
17. Lee S.L., Chu C.H., Luo Y.L., and Ho J.J. Chem. Phys. Lett. 207 (1993) 220
18. Lee C.K., and Lee S.L. Chem. Phys. Lett. 228 (1994) 539
19. Chen Z.W., Lai J.K.L., and Shek C.H. Phys. Lett. A 345 (2005) 218
20. Wang B., Wang Y., and Wu Z.Q. Solid State Commun. 96 (1995) 69
21. Huang L.J., Liu B.X., Ding J.R., and Li H.D. Phys. Rev. B 40 (1989) 858
22. Li H., Ding Z.J., and Wu Z.Q. Phys. Rev. B 51 (1995) 13554
23. Li H., Ding Z.J., and Wu Z.Q. Phys. Rev. B 53 (1996) 16631
24. Mandelbrot B.B. J. Fluid. Mech. 62 (1974) 331
25. Diego J.M., Martinez-Gonzales E., Sanz J.L., Mollerach S., and Martinez V.J. Mon. Not. R. Astron. Soc. 306 (1999) 427
26. Sun X., Fu Z., and Wu Z. Mater. Charact. 48 (2002) 169
27. Khue P.N., Huseby O., Saucier A., and Muller J. J. Phys.: Condens. Matter 14 (2002) 2347
28. Telesca L., Lapenna V., and Macchiato M. Chaos Solitons Fractals 19 (2004) 1
29. Chaudhari A., Yan C.C., and Lee S.L. Chem. Phys. Lett. 351 (2002) 341
30. Chaudhari A., Yan C.C., and Lee S.L. J. Phys. A: Math. Gen. 36 (2003) 3757
31. Ishida T., Kobayashi H., and Nakato Y. J. Appl. Phys. 73 9 (1993) 4344
32. Salehi A. Thin Solid Films 324 1-2 (1998) 214
33. Kobayashi H., Ishida T., Nakamura K., Nakato Y., and Tsubomura H. J. Appl. Phys. 72 11 (1992) 5288
34. Reference Manual for Nanoscope III, Digital Instrument, Santa Barbara, CA, 1996.
35. Buzio R., Gnecco E., Boragno C., Valbusa U., Piseri P., Barborini E., and Milani P. Surf. Sci. 444 (2000) L1
36. Arnault J.C., Knoll A., Smigiel E., and Cornet A. Appl. Surf. Sci. 171 (2001) 189
37. Li J.M., Lu L., Su Y., and Lai M.O. Appl. Surf. Sci. 161 (2000) 187